Equipment

Agilent 5100 VDV ICP-OES

PC controlled Vertical Dual View Inductively Coupled Plasma - Optical Emission Spectrometer.
Full wavelength coverage from 167–785 nm
Torch configuration suitable for inorganic solutions (excluding HF)

Autochem 2920

Fully automated catalyst characterization instrument via dynamic flow method
Gas analysis: Thermal conductivity detector (TCD) with Cirrus 2 Quadrupole Mass Spectrometer installation
Temperature: -100 - 1000 °C with Cryo-cooler installation
Analysis:
1) Temperature-programmed reduction (TPR); H₂
2) Temperature-programmed oxidation (TPO); O₂ and CO₂
3) Temperature-programmed desorption (TPD); CO₂ and NH₃
4) Chemisorption; H₂, CO and N₂O
5) Single point N₂ physisorption

BELCAT-M

Manual manipulation for catalyst characterization instrument via dynamic flow method
Gas analysis: Thermal conductivity detector (TCD)
Temperature: ambient – 1000 °C

BET - Anton Paar Nova 800

Heating immersion circulator, open bath heating circulator, refrigerated circulator

Analysis:

BET surface area
Langmuir surface areas
BJH pore size and pore volume distributions
t-plot
MP-method and Density Functional Theory
CO₂ isothermal analysis

DRIFTS - Nicolet 6700 FT-IR Spectrometer from Thermo Scientific

external page Click here to read about DRIFTS.

Pressure up to 30 bar using ZnSe window

DXR™ 2 Raman Microscope equipped with CCR1000 Linkam

Multiple Excitation Lasers: Supported wavelengths 455 nm, 532 nm, 780 nm
Equipped with digital video camera
10X, 20X, 50X and 100X microscope objectives, with brightfield/darkfield

Inverted Light Microscope - Leica

Solar simulator set-up (LOT-Oriel)

150 W Xe arc lamp
Filter for AM 1.5 and electronic shutter, combined with VoltaLab 40 potentiostat
So-called cappuccino cell (3-electrodes) available.

Enlarged view: Monochromatic light source

Monochromatic light source (LOT-Oriel)
Complete monochromatic light source for the building of an IPCE solar cell simulation, including 300 W Xe light source and 150 mm monochromator.

PANalytical Empyrean X-ray Powder Diffractometer

Instrument specifications

CuKα X-ray radiation (standard operation)
Bragg-Brentano HD incident beam optics
X’Celerator Scientific ultra-fast line detector
Sample changer for 15 samples and Si zero-background sample holders – 32 mm available
Data collector software: Highscore and ICDD PDF-2 2015 database
Mo X-ray radiation (installation on demand)
Diffracted beam 1d monochromator (for suppression of fluorescence radiation)
Capillary spinner stage (data collection in transmission geometry)
Anton Paar XRK 900 reaction chamber for powder XRD experiments at variable temperature, and in various gas atmospheres (reduced, oxidizing or inert atmospheres) is available

For more information contact: Abdala, Paula ; Donat Felix

UV-Vis - Perkin Elmer Lambda 750 Spectrophotometer

Cabable to measure UV-Vis to near IR
Harrick praying mantis cell for experiment at high pressure (up to 20 bar) and elevated temperature (up to 600°C)
Gas feeding system

DALCO HPC

696 cores ( Intel Xeon E5-2640 and Intel Xeon Phi 7210)
224 GB RAM for Xeon nodes
64 GB RAM ( 4 * 16 ) Xeon Phi nodes
40 TB HDD
26 TFlops

Photron Fastcam SA Z high speed camera

Resolution 1024 x 1024 to 20'000 FPS

ET 139 Labworks shaker

2.5 cm displacement
Sine: 180 N pk
Random: 75 N rms
Shock: 330 N pk
Frequency up to: 6,500 Hz

PID high pressure reactor

Two independent temperature and pressure controlled Hastelloy X reactors in parallel with completely independent gas and liquid feed control each
HPLC Gilson pump
Isco pump
2 liquid gas separators (one per reactor)
External box including 7 MFCs gas feed per each reactor (total 14 MFCs)
Maximum temperature at 1 bar : 1200 ºC
Maximum temperature at 100 bar : 800 ºC

Catalyst Testing Rig (Methane Reforming)

independent Bronkhorst MFCs to feed different reactant gases
Evaporator mixer for co-feeding of liquid (H2O) with reactant gases
Radiating furnace with low thermal inertia capable of reaching 950 °C
Stainless-steel and quartz, 9-mm reactors
PerkinElmer GC (Clarus 580) equipped with TCD and FID

Atomic Layer Deposition (ALD) - Picosun R-200

Integrated with nitrogen glove box
Sample holder for up to 8”/200mm wafers or pieces of wafers
4 separate precursor source systems: 2 liquid (PicosolutionTM 100) and 2 solid (Picosolid BoosterTM)
Ozone generator
Holder for depositing onto powder
Maximum deposition temperature of 500 °C

Ball mill

Dip coater HO-TH-02 (Holmarc)

Dip coating unit equipped with a hot chamber (temperature up to 75 °C)
Drawing speed minimum 2 μm/s, maximum 9000 2 μm/s.
5 programs in memory.

TGA DSC 3+ (Mettler Toledo)

Temperature range RT to 1600 °C
Temperature accuracy ± 0.3 K
Sample volume ≤ 900 μL
Measurement range ≤ 5g
Resolution 0.1 μg
Ambient pressure
Available gases: N₂, air, CO₂, H₂, CO

TGA Linseis HP

TGA Linseis LP